Semiconductor Wafer Processing Vacuum Solution

Semiconductor Wafer Processing Vacuum Solution

Project Date
June 2024
Location
South Korea
Industry
Semiconductor Industry
Client
Samsung Electronics Subsidiary
1440
m³/h Capacity
0.5
mbar Vacuum
90
kW Power
6
Units Deployed

Project Background

Market Demand & Expansion

A leading semiconductor manufacturer in South Korea was expanding their 300mm wafer fabrication facility to meet growing demand for advanced 5nm process chips. The expansion required installation of six new chemical vapor deposition (CVD) chambers, each demanding ultra-high vacuum performance.

Technical Challenges

The CVD process chambers required vacuum levels below 0.05 mbar with exceptional particle control. Any contamination or process gas residue could damage expensive wafers worth up to $500,000 each. The existing vacuum system was operating at maximum capacity with no room for expansion.

Clean Room Requirements

The installation had to be completed in an operational Class 1 cleanroom environment without disrupting existing production lines. All equipment must meet semiconductor industry standards for cleanliness, with documentation of particle counts and outgassing rates.

Uptime Criticality

With fab operating costs exceeding $50,000 per hour, any unplanned downtime directly impacts profitability. The new vacuum system required 99.99% reliability with hot-swappable components and redundant architecture.

Project Gallery

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Special Requirements

- Ultra-high vacuum capability < 0.05 mbar - Semiconductor-grade cleanroom compatibility - Corrosive gas handling (SiH4, NH3, WF6) - Particle generation < 0.1 particles/liter - SEMI S2 safety standard compliance - N2 purge system integration - Real-time vacuum monitoring with SECS/GEM protocol - Modular design for future expansion - ISO Class 1 cleanroom installation procedures - Complete process gas compatibility documentation

Our Solution

Engineered Vacuum Solution

We designed a comprehensive vacuum solution using six SCRV-240 anti-corrosive dry screw vacuum pumps specifically engineered for semiconductor applications. Each pump features specialized coating and sealing systems to withstand aggressive process gases.

Redundant Architecture

The system employs a 5+1 redundant configuration where five pumps handle normal production load while one remains on hot standby. Automatic failover switching ensures continuous operation even during pump maintenance or unexpected failures.

Process Integration

Each CVD chamber connects to its dedicated vacuum pump through heated forelines maintained at 120°C to prevent condensation of process byproducts. Advanced butterfly valves provide precise pressure control and chamber isolation.

Smart Monitoring System

The integrated SCADA system monitors over 50 parameters per pump including vibration, temperature, pressure, and motor current. Predictive algorithms analyze trends to schedule maintenance before failures occur, maximizing uptime.

Cleanroom Installation

Our specialized cleanroom installation team completed the project using approved protocols including airlocks, HEPA filtration, and continuous particle monitoring. All components were pre-cleaned and bagged before entering the cleanroom environment.

Project Video

Project Results & Impact

Production Excellence

Since installation completion, the facility has achieved 99.995% vacuum system uptime over 8 months of operation. Zero process gas incidents have been recorded, and all CVD chambers maintain consistent process conditions resulting in improved wafer yield rates.

Cost Savings Realized

Energy consumption decreased by 42% compared to the previous benchmark system, saving approximately $180,000 annually. Reduced maintenance requirements lowered operational costs by 55%, with service intervals extended from 2,000 to 8,000 hours.

Yield Improvement

Stable vacuum conditions contributed to a 3.2% improvement in wafer yield, representing an additional revenue of $2.4 million per quarter. Process gas efficiency improved by 15%, reducing consumable costs.

Capacity Expansion

The modular system design enabled seamless integration of two additional CVD chambers six months after initial installation, increasing production capacity by 33% with minimal downtime and no system redesign required.

99.995%
System Uptime
42%
Energy Savings
3.2%
Wafer Yield Improvement

Product Series

SCRV Series (Anti-Corrosive Vacuum Pump)
Model Number
SCRV-240SC

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Technical Specifications

Particle Generation <0.1 particles/L
Gas Compatibility Corrosive gases
Coating Material PFA/PTFE
Cleanroom Class ISO Class 1

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