Market Demand & Expansion
A leading semiconductor manufacturer in South Korea was expanding their 300mm wafer fabrication facility to meet growing demand for advanced 5nm process chips. The expansion required installation of six new chemical vapor deposition (CVD) chambers, each demanding ultra-high vacuum performance.
Technical Challenges
The CVD process chambers required vacuum levels below 0.05 mbar with exceptional particle control. Any contamination or process gas residue could damage expensive wafers worth up to $500,000 each. The existing vacuum system was operating at maximum capacity with no room for expansion.
Clean Room Requirements
The installation had to be completed in an operational Class 1 cleanroom environment without disrupting existing production lines. All equipment must meet semiconductor industry standards for cleanliness, with documentation of particle counts and outgassing rates.
Uptime Criticality
With fab operating costs exceeding $50,000 per hour, any unplanned downtime directly impacts profitability. The new vacuum system required 99.99% reliability with hot-swappable components and redundant architecture.